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Molecular dynamics simulating the effects of Shockley-type stacking faults on the radiation displacement cascades in 4H-SiC

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Four layers hexagonal silicon carbide (4H-SiC) is a promising material for high-temperature and radiation-rich environments due to its excellent thermal conductivity and radiation resistance.

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However, real 4H-SiC crystals often contain Shockley-type stacking faults (SSF), which can affect their radiation resistance. This study employs molecular dynamics method to explore the effects of SSF on radiation displacement cascades in 4H-SiC.

We conducted a comprehensive study of various SSF within the crystalline framework of 4H-SiC, and analyzed their stacking fault energy (SFE). We simulated the radiation displacement cascade in 4H-SiC with SSF and analyzed the effects of SSF on the distribution of radiation displacement defects. We simulated the radiation displacement cascade in 4H-SiC with SSF under different energies of primary knock-on atom (EPKA) and temperatures (T) conditions, and analyzed the variation pattern of the number of radiation displacement defects and clusters. The results indicate that SSF limits defect distribution position.

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SSF has an effect on the defects and clusters of 4H-SiC in displacement cascade, and SSF can affect the maximum working temperature of 4H-SiC.

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ScienceDB10.57760/sciencedb.0903312 d agoJSON v1
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